GROWTH OF NATIVE OXIDE LAYERS ON INP

被引：0
|
作者：
MITTOVA, IY
BORZAKOVA, GV
TEREKHOV, VA
MITTOV, ON
PSHESTANCHIK, VR
KASHKAROV, VM
机构：
来源：
INORGANIC MATERIALS | 1991年 / 27卷 / 10期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1738 / 1742
页数：5
相关论文
共 50 条
  • [1] GROWTH OF ANODIC AL2O3/NATIVE OXIDE DOUBLE-LAYERS ON INP
    CHANG, RR
    HWANG, T
    GEIB, KM
    WILMSEN, CW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (05) : 1243 - 1247
  • [2] THE INFLUENCE OF NATIVE OXIDE LAYERS OF INP ON THE SHAPE OF ETCHING PROFILES AT RESIST EDGES
    NOTTEN, PHL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (01) : 243 - 249
  • [3] AN ETCHANT FOR INP NATIVE OXIDE
    SCHMITT, F
    SUSA, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (04): : 761 - 761
  • [4] Growth of thermal oxide layers on GaAs and InP in the presence of ammonium heptamolybdate
    Mittova, IY
    Lavrushina, SS
    Afonchikova, AV
    RUSSIAN JOURNAL OF INORGANIC CHEMISTRY, 2004, 49 (08) : 1138 - 1142
  • [5] Catalyst Design for Native Oxide Based Selective Area InP Nanowire Growth
    Calahorra, Yonatan
    Greenberg, Yaakov
    Cohen, Shimon
    Ritter, Dan
    2012 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS (IPRM), 2013, : 265 - 268
  • [6] INP NATIVE OXIDE - A DRIFT FACTOR IN INP-MIS
    PHAM, VV
    ESTEVE, D
    FARRE, J
    ELMAHDY, A
    RONDA, M
    SIMONNE, JJ
    APPLIED SURFACE SCIENCE, 1987, 30 (1-4) : 83 - 88
  • [7] GROWTH OF ASYMMETRIC LAYERS ON INP(110)
    TULKE, A
    LUTH, H
    SURFACE SCIENCE, 1989, 211 (1-3) : 1001 - 1011
  • [8] Growth kinetics of thick InP layers
    Srobár, F
    Procházková, O
    ASDAM 2004: The Fifth International Conference on Advanced Semiconductor Devices and Microsystems, 2004, : 65 - 68
  • [9] Resistivity measurement of epitaxially grown silicon layers The influence of native oxide growth
    Bitzer, Th.
    Baumgartl, J.
    Krzych, G.
    Tsidilkovski, E.
    2008 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, 2008, : 378 - +
  • [10] INSITU PROCESSING OF INP WITH AN ULTRATHIN NATIVE OXIDE MASK
    WANG, YL
    TEMKIN, H
    HARRIOTT, LR
    JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (07) : 2 - 2
12345