INTERNAL-STRESSES AND ANTIFERROMAGNETISM IN EVAPORATED CR FILMS

被引：2

作者：

CHERIET, L ^{[1
]}

ARAJS, S ^{[1
]}

HELBIG, HF ^{[1
]}

机构：

[1] CLARKSON UNIV,CTR ADV MAT PROC,POTSDAM,NY 13676

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 67卷 / 09期

关键词：

D O I：

10.1063/1.345922

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have prepared Cr films with thicknesses up to 100 nm by evaporation in ultrahigh (10-7 Torr) vacuum onto Corning glass (7059) substrates. The resistance of the films was measured in situ as a function of temperature and the shifts in Néel temperatures were measured as a function of film thickness. By using different substrate temperatures, it is possible to create compressive or tensile stresses in these films, which have a remarkable effect on the spin-density wave-paramagnetic transition. The results can be nicely correlated with the direct stress measurements of Abermann and Martinz.

引用

页码：5672 / 5673

页数：2

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