PHOTODEPOSITION OF THIN POLYDIACETYLENE FILMS FROM SOLUTION THAT EXHIBIT LARGE 3RD-ORDER OPTICAL NONLINEARITIES

被引：8
|
作者：
PALEY, MS [1 ]
FRAZIER, DO [1 ]
ABDELDAYEM, H [1 ]
MCMANUS, SP [1 ]
机构：
[1] UNIV ALABAMA,PROGRAM MAT SCI,HUNTSVILLE,AL 35899
来源：
CHEMISTRY OF MATERIALS | 1994年 / 6卷 / 12期
关键词：
D O I：
10.1021/cm00048a005
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A novel technique has been developed for preparing thin amorphous films of a polydiacetylene derivative of 2-methyl-4-nitroaniline (MNA) using photodeposition from monomer solutions. This heretofore unknown process yields films that possess very high optical quality and exhibit large third-order nonlinear optical susceptibilities (10(-8)-10(-7) esu). Photodeposition can also be carried out using lasers to form thin optical circuits. This could eventually make the application of polydiacetylene thin films for nonlinear optical devices such as waveguides and integrated optics more commercially feasible.
引用
收藏
页码：2213 / 2215
页数：3
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