PHOTOELECTROCHEMICAL DEPTH PROFILING OF MOLECULAR-BEAM EPITAXY GROWN GROUP-III-V HETEROSTRUCTURES

被引:2
|
作者
WEI, C
RAJESHWAR, K
ALAVI, K
PATHAK, RN
WANG, LT
机构
[1] UNIV TEXAS,DEPT CHEM,ARLINGTON,TX 76019
[2] UNIV TEXAS,DEPT ELECT ENGN,ARLINGTON,TX 76019
关键词
D O I
10.1063/1.107339
中图分类号
O59 [应用物理学];
学科分类号
摘要
A depth profiling technique is described for molecular beam epitaxy grown (Al,Ga)Al/GaAs heterostructures which combines photoelectrochemical layer-by-layer removal with analyses by photocurrent spectroscopy. The technique is illustrated for two types of samples having a graded and "flat" Al profile in the epilayer.
引用
收藏
页码:1348 / 1350
页数:3
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