HIGH TEMPERATURE FURNACE FOR ELECTRON DIFFRACTION STUDIES OF THIN FILMS

被引：4

|

作者：

ALESSANDRINI, EI

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1949年 / 20卷 / 07期

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D O I：

10.1063/1.1698509

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：691 / 693

页数：3

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