WAFER CHARGEUP STUDY ON THE PR-80 HIGH-CURRENT ION-IMPLANTATION MACHINE

被引：10
|
作者：
NAGAI, N
KAWAI, T
NAITO, M
NISHIGAMI, Y
FUJISAWA, H
NISHIKAWA, K
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷
关键词：
D O I：
10.1016/0168-583X(89)90249-8
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：572 / 575
页数：4
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