STRESS-CONCENTRATIONS AT AN OBLIQUE HOLE IN A THICK FLAT-PLATE UNDER AN ARBITRARY INPLANE BIAXIAL LOADING

被引：3

作者：

STANLEY, P ^{[1
]}

DAY, BV ^{[1
]}

机构：

[1] NNC LTD,KNUTSFORD,CHESHIRE,ENGLAND

来源：

JOURNAL OF STRAIN ANALYSIS FOR ENGINEERING DESIGN | 1993年 / 28卷 / 03期

关键词：

D O I：

10.1243/03093247V283223

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The results of an extensive 'frozen-stress' photoelastic investigation of the stresses at isolated oblique holes in thick wide plates subjected to uniform uniaxial tension are used to provide stress concentration factors at such holes resulting from any form of biaxial in-plane loading. The work covers plate thickness/hole diameter ratios from 1.3 to 3.0 and hole obliquity angles up to 60 degrees. Over these ranges the effects of changes in the plate thickness/hole diameter ratio are not of major importance but the effects of changes in the angle of obliquity are considerable.

引用

页码：223 / 235

页数：13

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