VAPOR DEPOSITION AND PROPERTIES OF ALUMINA-SILICA FILMS

被引：0
|
作者：
MATSUSHI.M
KOGA, Y
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1968年 / 115卷 / 08期
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暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
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页码：C239 / &
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