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- [1] CHROMIUM AS A DIFFUSION BARRIER BETWEEN NISI, PD2SI, OR PTSI AND ALJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (05) : 1118 - 1122BARTUR, MNICOLET, MA
- [2] DIFFUSION OF PD AND SI THROUGH PD2SIJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C99 - C99ZINGU, ECPRETORIUS, RCOMRIE, CMAYER, JW
- [3] TANTALUM NITRIDE AS A DIFFUSION BARRIER BETWEEN PD2SI OR COSI2 AND ALUMINUMJOURNAL OF APPLIED PHYSICS, 1989, 65 (08) : 3017 - 3022FAROOQ, MAMURARKA, SPCHANG, CCBAIOCCHI, FA
- [4] QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY OF PTSI AND PD2SIFRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1993, 346 (1-3): : 308 - 309WIRTH, T
- [5] EPITAXIAL PTSI AND PD2SI FORMED BY RAPID THERMAL ANNEALINGMATERIALS LETTERS, 1985, 3 (5-6) : 242 - 246LARSEN, ANCHEVALLIER, JPEDERSEN, AS
- [6] CHROMIUM THIN-FILM AS A BARRIER TO INTERACTION OF PD2SI WITH ALSOLID-STATE ELECTRONICS, 1977, 20 (05) : 413 - 415OLOWOLAFE, JONICOLET, MAMAYER, JW
- [7] REORDERING OF POLYCRYSTALLINE PD2SI ON EPITAXIAL PD2SIJOURNAL OF APPLIED PHYSICS, 1988, 63 (07) : 2402 - 2405COMRIE, CMLIU, JCHUNG, LSMAYER, JW
- [8] A STRUCTURE MARKER STUDY FOR PD2SI FORMATION - PD MOVES IN EPITAXIAL PD2SIJOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 224 - 226LIEN, CDNICOLET, MAPAI, CS
- [9] CHROMIUM AS A DIFFUSION BARRIER BETWEEN NISI OR PTSI AND ALJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) : C325 - C325BARTUR, MNICOLET, MA
- [10] DIFFUSION OF SILICON IN PD2SI DURING GROWTHJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 1492 - 1496COMRIE, CMEGAN, JM