OBSERVATION OF AMORPHOUS-SILICON REGIONS IN SILICON-RICH SILICON DIOXIDE FILMS

被引：39
|
作者：
HARTSTEIN, A
TSANG, JC
DIMARIA, DJ
DONG, DW
机构：
来源：
APPLIED PHYSICS LETTERS | 1980年 / 36卷 / 10期
关键词：
D O I：
10.1063/1.91341
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：836 / 837
页数：2
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