DISCUSSION OF DEPOSITION OF MOS2 FILMS BY PHYSICAL SPUTTERING AND THEIR LUBRICATION PROPERTIES IN VACUUM

被引：0
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作者：
LAVIK, M
HALTNER, AJ
SPALVINS, T
机构：
来源：
ASLE TRANSACTIONS | 1969年 / 12卷 / 01期
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中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
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页码：41 / &
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