FABRICATION OF SIO2-BLAZED HOLOGRAPHIC GRATINGS BY REACTIVE ION ETCHING

被引：0
|
作者：
MATSUI, S [1 ]
YAMATO, T [1 ]
ARITOME, H [1 ]
NAMBA, S [1 ]
机构：
[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C109 / C109
页数：1
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