HIGH-PRESSURE THERMAL-OXIDATION OF SILICON

被引：0
|
作者：
THOMPSON, T
WIESNER, J
CARLSON, D
KLINE, R
机构：
[1] APPL MAT INC,SANTA CLARA,CA 95057
[2] GASONICS INC,MT VIEW,CA 94043
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C118 / C118
页数：1
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