EFFECT OF TEMPERATURE-FIELD ON GROWTH STABILITY

被引:5
|
作者
GRASZA, K [1 ]
机构
[1] INST ELECTRON TECHNOL, PL-01919 WARSAW, POLAND
关键词
D O I
10.1016/0022-0248(94)00518-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The effect of temperature field of the growth system on the morphology of the Pb0.8Sn0.2Te solid-vapour interface is studied. The first stage of seed formation and growth in a novel method of self nucleation and growth without contact with ampoule wall [K. Grasza et al., J. Crystal Growth 123 (1992) 519] is discussed. The seeds were grown in different temperature profiles with the same growth velocity and at the same temperature. The resulting crystals were always strongly faceted, with a stable solid-Vapour interface, if the radial temperature gradient inside the crystal was large. The solid-vapour interface was unstable, if the radial temperature gradient inside the crystal was low.
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页码:69 / 74
页数:6
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