CRYSTALLIZATION OF AMORPHOUS TI-SI ALLOY THIN-FILMS - MICROSTRUCTURE AND RESISTIVITY

被引：24
|
作者：
RAAIJMAKERS, IJMM
VANOMMEN, AH
READER, AH
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 10期
关键词：
D O I：
10.1063/1.343353
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：3896 / 3906
页数：11
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