THE EFFECT OF IMPLANT SPECIES ON DEFECT ANNEAL KINETICS .1. SILICON AND PHOSPHORUS IMPLANTATION

被引：12
|
作者：
PRUSSIN, S [1 ]
JONES, KS [1 ]
机构：
[1] UNIV CALIF BERKELEY,DEPT MAT SCI & MINERAL ENGN,BERKELEY,CA 94720
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 21卷 / 2-4期
关键词：
D O I：
10.1016/0168-583X(87)90888-3
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：496 / 498
页数：3
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