SOME PROPERTIES OF CARBON-FILMS DEPOSITED BY LASER-ABLATION

被引:13
|
作者
JELINEK, M [1 ]
OLSAN, V [1 ]
SOUKUP, L [1 ]
CHARALABIDIS, D [1 ]
HONTZOPOULOS, E [1 ]
GEORGIOU, E [1 ]
机构
[1] FDN RES & TECHNOL HELLAS,INST ELECTR STRUCT & LASER,IRAKLION 71110,GREECE
关键词
D O I
10.1016/0925-9635(94)90106-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hard carbon films were prepared by KrF excimer laser ablation from graphite and glassy carbon targets for different power densities (1 x 10(8)-3.5 x 10(9) W cm-2), Substrate temperatures T(s) (from room temperature to 300-degrees-C) and deposition rates. Optical and electrical properties, Raman spectra, microhardness and morphology of the layers and time-of-flight (TOF) and resonant ionization spectroscopy of particles ablated from targets were studied. The best film properties were obtained for high densities and low T(s). In TOF spectra the ions of C+, C2+, C++ and C3+ were identified.
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页码:1128 / 1131
页数:4
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