INITIAL PROBABILITY OF DISSOCIATIVE CHEMISORPTION OF OXYGEN ON IRIDIUM(110)

被引:33
|
作者
KELLY, D
VERHOEF, RW
WEINBERG, WH
机构
[1] Department of Chemical Engineering, University of California, Santa Barbara
来源
JOURNAL OF CHEMICAL PHYSICS | 1995年 / 102卷 / 08期
关键词
D O I
10.1063/1.469217
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The dissociative chemisorption of oxygen on Ir(110) has been investigated using supersonic molecular beam techniques. The initial probability of dissociative chemisorption (in the limit of zero surface coverage) as a function of incident kinetic energy between 1 and 28 kcal/mol and surface temperature from 85 to 1000 K is reported. For beam kinetic energies less than approximately 4 kcal/mol, the measured values of the initial probability of dissociative chemisorption are explained by a trapping-mediated adsorption mechanism. In this adsorption regime initial probabilities of dissociative chemisorption decrease with both increasing beam energy and surface temperature. The trapping probability of oxygen into the physically adsorbed state on Ir(110) as a function of incident beam energy is presented. For beam kinetic energies greater than ∼4 kcal/mol, a direct chemisorption mechanism dominates. In the direct adsorption regime, initial probabilities of dissociative chemisorption increase with increasing beam energy, and they are dependent on surface temperature, with the dependence decreasing with increasing surface temperature. This behavior is attributed to direct chemisorption into a molecularly chemisorbed state, from which there is a thermally activated kinetic competition between desorption and dissociation. A pseudo-steady-state kinetic model including physically adsorbed oxygen, molecularly chemisorbed oxygen, and atomically chemisorbed oxygen is applied to find that the activation barrier to desorption from the physically adsorbed molecular state is 1.6±0.1 kcal/mol higher than the barrier to conversion to the molecularly chemisorbed state. The activation barrier for desorption from the molecularly chemisorbed state is 1.5±0.15 kcal/mol greater than the barrier to dissociation from this state. © 1995 American Institute of Physics.
引用
收藏
页码:3440 / 3447
页数:8
相关论文
共 50 条
  • [1] CHEMISORPTION OF OXYGEN ON THE (110) SURFACE OF IRIDIUM
    IBBOTSON, DE
    TAYLOR, JL
    WEINBERG, WH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 439 - 440
  • [2] CHEMISORPTION OF OXYGEN ON THE (110) SURFACE OF IRIDIUM
    TAYLOR, JL
    IBBOTSON, DE
    WEINBERG, WH
    [J]. SURFACE SCIENCE, 1979, 79 (02) : 349 - 384
  • [3] DISSOCIATIVE VERSUS MOLECULAR CHEMISORPTION OF OXYGEN ON CU(110)
    WANDER, A
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 1989, 1 : SB183 - SB183
  • [4] DISSOCIATIVE VERSUS MOLECULAR CHEMISORPTION OF OXYGEN ON CU(110)
    WANDER, A
    [J]. SURFACE SCIENCE, 1989, 216 (1-2) : L347 - L350
  • [5] EFFECT OF INTERNAL ENERGY ON THE DISSOCIATIVE CHEMISORPTION OF OXYGEN ON IR(110)
    KELLY, D
    VERHOEF, RW
    WEINBERG, WH
    [J]. SURFACE SCIENCE, 1994, 321 (1-2) : L157 - L163
  • [6] Kinetics and dynamics of the initial dissociative chemisorption of oxygen on Ru(001)
    Wheeler, MC
    Seets, DC
    Mullins, CB
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1996, 105 (04): : 1572 - 1583
  • [7] MOLECULAR-BEAM STUDY OF THE DISSOCIATIVE CHEMISORPTION OF OXYGEN ON W(110)
    RETTNER, CT
    DELOUISE, LA
    AUERBACH, DJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 1491 - 1492
  • [8] EFFECT OF PREADSORBED OXYGEN ON THE DIRECT DISSOCIATIVE CHEMISORPTION OF ETHANE ON IR(110)
    KELLY, D
    HAGO, W
    WEINBERG, WH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 1426 - 1430
  • [9] OXYGEN-CHEMISORPTION ON CR(110) .1. DISSOCIATIVE ADSORPTION
    SHINN, ND
    MADEY, TE
    [J]. SURFACE SCIENCE, 1986, 173 (2-3) : 379 - 394
  • [10] Effect of preadsorbed oxygen on the direct dissociative chemisorption of ethane on Ir(110)
    Kelly, D.
    Hago, W.
    Weinberg, W.H.
    [J]. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1995, 13 (03): : 1426 - 1430