UNIFORMITY MAPPING IN ION-IMPLANTATION .2.

被引:0
|
作者
YARLING, CB
JOHNSON, WH
KEENAN, WA
LARSON, LA
机构
[1] PROMETRIX CORP,SANTA CLARA,CA
[2] NATL SEMICOND CORP,SANTA CLARA,CA 95051
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Part I of this article (SST, December 1991) reviewed the history of ion implant uniformity mapping. In Part II, presently available equipment and techniques are reviewed and their capabilities summarized.
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页码:29 / 32
页数:4
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