ENERGY-LEVELS AND DEFECT SIGNATURE OF SULFUR-IMPLANTED SILICON BY THERMALLY STIMULATED MEASUREMENTS

被引:15
|
作者
KOYAMA, RY [1 ]
PHILLIPS, WE [1 ]
MYERS, DR [1 ]
LIU, YM [1 ]
DIETRICH, HB [1 ]
机构
[1] USN,RES LAB,WASHINGTON,DC 20375
关键词
D O I
10.1016/0038-1101(78)90293-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:953 / 955
页数:3
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