ROLE OF ARGON INVOLVED IN PLASMA-DEPOSITED AMORPHOUS SI-H FILMS

被引：41

|

作者：

TANAKA, K

YAMASAKI, S

NAKAGAWA, K

MATSUDA, A

OKUSHI, H

MATSUMURA, M

IIZIMA, S

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1980年 / 35-6卷 / JAN-期

关键词：

D O I：

10.1016/0022-3093(80)90640-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：475 / 480

页数：6

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