AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF SILVER, PALLADIUM AND METAL ALLOY (AG1-XPDX, AG1-XCUX AND PD1-XCUX) FILMS

被引：40

作者：

XU, CY ^{[1
]}

HAMPDENSMITH, MJ ^{[1
]}

KODAS, TT ^{[1
]}

机构：

[1] UNIV NEW MEXICO,DEPT CHEM ENGN,ALBUQUERQUE,NM 87131

来源：

ADVANCED MATERIALS | 1994年 / 6卷 / 10期

关键词：

D O I：

10.1002/adma.19940061005

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Thermally labile, low-volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high-quality metal films. Here, a new method, aerosol-assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors.

引用

页码：746 / 748

页数：3

共 12 条

[1] SYNTHESIS AND STRUCTURE DETERMINATION OF (HFAC)AG(SET(2)), PD(HFAC-C)(HFAC-O,O)(SET(2)), AND [(HFAC)AG](4)(SET(2)) - LIGAND-EXCHANGE REACTIONS RELEVANT TO AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF AG1-XPDX FILMS
XU, CY
HAMPDENSMITH, MJ
KODAS, TT
DUESLER, EN
RHEINGOLD, AL
YAP, G
INORGANIC CHEMISTRY, 1995, 34 (19) : 4767 - 4773
[2] Growth and characterization of MgxZn1−xO thin films by aerosol-assisted chemical vapor deposition (AACVD)
Akash Shukla
Vipin K. Kaushik
Dixit Prasher
Electronic Materials Letters, 2014, 10 : 61 - 65
[3] AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF BINARY ALLOY (AGXPD1-X, CUXPD1-X, AGXCU1-X) FILMS AND STUDIES OF THEIR COMPOSITIONAL VARIATION
XU, CY
HAMPDENSMITH, MJ
KODAS, TT
CHEMISTRY OF MATERIALS, 1995, 7 (08) : 1539 - 1546
[4] Growth and Characterization of MgxZn1-xO Thin Films by Aerosol-Assisted Chemical Vapor Deposition (AACVD)
Shukla, Akash
Kaushik, Vipin K.
Prasher, Dixit
ELECTRONIC MATERIALS LETTERS, 2014, 10 (01) : 61 - 65
[5] Aerosol-assisted chemical vapor deposition (AACVD) of binary films of Ag-Pd, Cu-Pd and Ag-Cu alloys, ZnS and SnO2: The role of precursor chemistry
Xu, C.
Nyman, M.
Caruso, J.
Hampden-Smith, M.J.
Kodas, T.T.
Journal of Aerosol Science, 1995, 26 (Suppl 1):
[6] Aerosol-assisted chemical vapour deposition (AACVD) of silver films from triphenylphosphine adducts of silver β-diketonates and β-diketoiminates, including the structure of [Ag(hfac)(PPh3)]
Edwards, DA
Harker, RM
Mahon, MF
Molloy, KC
JOURNAL OF MATERIALS CHEMISTRY, 1999, 9 (08) : 1771 - 1780
[7] Aerosol-assisted chemical vapour deposition (AACVD) of silver films from triorganophosphine adducts of silver carboxylates, including the structure of [Ag(O2CC3F7)(PPh3)2]
Edwards, DA
Harker, RM
Mahon, MF
Molloy, KC
INORGANICA CHIMICA ACTA, 2002, 328 (01) : 134 - 146
[8] Deposition of copper-doped iron sulfide (CuXFe1-XS) thin films using aerosol-assisted chemical vapor deposition technique
Disale, Sujit D.
Garje, Shivram S.
APPLIED ORGANOMETALLIC CHEMISTRY, 2010, 24 (10) : 734 - 740
[9] Single-Source Precursor for Tungsten Dichalcogenide Thin Films: Mo1-xWxS2 (0 ≤ x ≤ 1) Alloys by Aerosol-Assisted Chemical Vapor Deposition
Tedstone, Aleksander A.
Lewis, Edward A.
Savjani, Nicky
Zhong, Xiang Li
Haigh, Sarah J.
O'Brien, Paul
Lewis, David J.
CHEMISTRY OF MATERIALS, 2017, 29 (09) : 3858 - 3862
[10] The influence of precursor on rhenium incorporation into Re-doped MoS2 (Mo1-xRexS2) thin films by aerosol-assisted chemical vapour deposition (AACVD)
Al-Dulaimi, Naktal
Lewis, Edward A.
Savjani, Nicky
McNaughter, Paul D.
Haigh, Sarah J.
Malik, M. Azad
Lewis, David J.
O'Brien, Paul
JOURNAL OF MATERIALS CHEMISTRY C, 2017, 5 (35) : 9044 - 9052

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