PHOTOLYSIS OF NCL3 IN LOW-TEMPERATURE ARGON MATRICES

被引：9

作者：

GILBERT, JV

SMITH, LJ

机构：

[1] Chemistry Department, University of Denver, Denver

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1991年 / 95卷 / 19期

关键词：

D O I：

10.1021/j100172a034

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

NCl3 has been photolyzed in low-temperature argon matrices and the products identified via the IR spectra of the matrices. For matrices in which the NCl3 was not aggregated with Cl2, NCl was produced at all photolysis wavelengths used (220, 248, 280, and 330 nm, selected on the basis of the UV absorption spectrum of NCl3 and Cl2). In matrices in which significant amounts of NCl3/Cl2 aggregates were deposited, NCl2 was also produced. The rate of production of NCl as function of photolysis time tracks the NCl3 UV absorbance and is proportional to the photolysis light intensity.

引用

页码：7278 / 7281

页数：4

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