LASER-INDUCED ATOMIC CHLORINE ETCHING OF SILICON

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作者：
TREYZ, GV
SCARMOZZINO, R
BURKE, HH
OSGOOD, RM
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来源：
LASER- AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES | 1989年 / 129卷
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
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页码：291 / 297
页数：7
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