ULTRAHIGH-VACUUM APPARATUS FOR SILICON MOLECULAR-BEAM EPITAXY

被引：0
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作者：
KANTER, BZ
MOSHEGOV, NT
NIKIFOROV, AI
STENIN, SI
TIIS, SA
机构：
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 1988年 / 31卷 / 02期
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：461 / 464
页数：4
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