GROWTH OF EPITAXIAL CO/CU SUPERLATTICES WITH SURFACE ORIENTATIONS OF (111), (100) AND (110) BY DC MAGNETRON SPUTTERING

被引：7

作者：

KINGETSU, T ^{[1
]}

YOSHIZAKI, F ^{[1
]}

机构：

[1] NISSHIN STEEL CO LTD,ADV MAT RES LABS,ICHIKAWA,CHIBA 272,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 4A期

关键词：

EPITAXIAL GROWTH; SPUTTER DEPOSITION; CO CU SUPERLATTICE; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION; SURFACE ORIENTATION; X-RAY DIFFRACTION; GIANT MAGNETORESISTANCE;

D O I：

10.1143/JJAP.33.2041

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Epitaxial Co/Cu superlattices with three major surface orientations of (111), (100) and (110) were successfully grown by dc magnetron sputter deposition with a base pressure of an ultrahigh vacuum. X-ray diffraction profiles suggested that the structures of the interfaces between Co and Cu layers were diff orient among the (111)-, (100)- and (110)-oriented superlattices even when prepared under the same conditions.

引用

页码：2041 / 2042

页数：2

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