PHOTOELECTROMOTIVE FORCE IN LEAD SULFIDE PHOTORESISTANCES

被引：0

作者：

BERLAGA, RY

RUMSH, MA

STRAKHOV, LP

机构：

来源：

ZHURNAL TEKHNICHESKOI FIZIKI | 1955年 / 25卷 / 11期

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暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1878 / 1882

页数：5

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