MICRODISTORTION MEASUREMENT IN AU TEXTURED THIN-FILMS BY X-RAY-DIFFRACTION

被引：19
|
作者：
DURAND, N
BIMBAULT, L
BADAWI, KF
GOUDEAU, P
机构：
来源：
JOURNAL DE PHYSIQUE III | 1994年 / 4卷 / 06期
关键词：
D O I：
10.1051/jp3:1994183
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Microdistorsion analysis in Au 150 nm thin films is presented in this study. Applying the method of the << integral width >>, known and employed in bulk materials, we have shown its feasibility and its interest in the case of thin films. Furthermore, in relation with X-Ray diffraction stress measurement. we found important effects of the deposition conditions on the films microstructure.
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收藏
页码：1025 / 1032
页数：8
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