STRESS REDUCTION IN ION-BEAM SPUTTERED MIXED-OXIDE FILMS

被引:58
|
作者
POND, BJ
DEBAR, JI
CARNIGLIA, CK
RAJ, T
机构
关键词
D O I
10.1364/AO.28.002800
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:2800 / 2805
页数:6
相关论文
共 50 条
  • [1] CHARACTERIZATION OF SUPPORTED MIXED-OXIDE ELECTROCATALYSTS BY ION-BEAM TECHNIQUES
    BATTAGLIN, G
    DEBATTISTI, A
    BARBIERI, A
    GIATTI, A
    MARCHI, A
    [J]. SURFACE SCIENCE, 1991, 251 : 73 - 77
  • [2] INTERNAL-STRESS IN ION-BEAM SPUTTERED MOLYBDENUM FILMS
    SUN, SS
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 572 - 576
  • [3] Reduction of mechanical losses in ion-beam sputtered tantalum oxide thin films via partial crystallization
    Favaro, Giulio
    Milotti, Valeria
    Riega, Diego Alonso Diaz
    Busdon, Nicole
    Bazzan, Marco
    Granata, Massimo
    Hofman, David
    Michel, Christophe
    Pinard, Laurent
    Conti, Livia
    Capaccioli, Simone
    Shcheblanov, Nikita S.
    Lemaitre, Anael
    Martinez, Valerie
    Cagnoli, Gianpietro
    Piergiovanni, Francesco
    Fabrizi, Federica
    Pelizzo, Maria G.
    Corso, Alain J.
    [J]. CLASSICAL AND QUANTUM GRAVITY, 2024, 41 (10)
  • [4] GROWTH AND PROPERTIES OF ION-BEAM SPUTTERED HGCDTE FILMS
    KRISHNASWAMY, SV
    TAKEI, WJ
    FRANCOMBE, MH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 849 - 850
  • [5] EFFECT OF HYDROGEN ON THE INTRINSIC STRESS IN ION-BEAM SPUTTERED AMORPHOUS-SILICON FILMS
    WINDISCHMANN, H
    COLLINS, RW
    CAVESE, JM
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1986, 85 (03) : 261 - 272
  • [6] NUCLEATION AND GROWTH OF ION-BEAM SPUTTERED METAL-FILMS
    XU, S
    EVANS, BL
    [J]. JOURNAL OF MATERIALS SCIENCE, 1992, 27 (11) : 3108 - 3117
  • [7] Phase transformation and morphological evolution of ion-beam sputtered tin oxide films on silicon substrate
    Choe, YS
    Chung, JH
    Kim, DS
    Kim, GH
    Baik, HK
    [J]. MATERIALS RESEARCH BULLETIN, 1999, 34 (09) : 1473 - 1479
  • [8] Temperature dependence of the optical properties of ion-beam sputtered ZrN films
    Larijani, M. M.
    Kiani, M.
    Jafari-Khamse, E.
    Fathollahi, V.
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2014, 117 (03): : 1179 - 1183
  • [9] SUPERCONDUCTING ION-BEAM SPUTTERED CHROMIUM METAL THIN-FILMS
    SCHMIDT, PH
    HUBER, JG
    FERTIG, WA
    BARZ, H
    CASTELLANO, RN
    MATTHIAS, BT
    [J]. PHYSICS LETTERS A, 1972, A 41 (04) : 367 - +
  • [10] IMPROVED TRIBOLOGICAL PROPERTIES OF SPUTTERED MOSX FILMS BY ION-BEAM MIXING
    KOBS, K
    DIMIGEN, H
    HUBSCH, H
    TOLLE, HJ
    LEUTENECKER, R
    RYSSEL, H
    [J]. APPLIED PHYSICS LETTERS, 1986, 49 (09) : 496 - 498