MULTIPLE-SCATTERING AND PLANAR DECHANNELING IN SILICON AND GERMANIUM

被引：47

作者：

FELDMAN, LC

APPLETON, BR

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

[2] OAK RIDGE NATL LAB,OAK RIDGE,TN 37830

来源：

PHYSICAL REVIEW B | 1973年 / 8卷 / 03期

关键词：

D O I：

10.1103/PhysRevB.8.935

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：935 / 951

页数：17

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