FUNDAMENTAL PROCESSES DETERMINING THE HIGHLY CHARGED ION PRODUCTION IN ECR ION SOURCES

The ion confinement and loss conditions in the open magnetic traps have been analyzed in this article. In ECRIS the ions are confined in the negative potential well. The ions with higher charged states have the longer lifetimes and the less probability of escaping from the negative potential well. The mean charged ion state in the trap is higher than in the output ion beam. The general methods to increase the multiply charged ion extraction from the ECRIS are determined. The usage of the ion cooling mode to increase charged ion states in the plasma is substantiated. The large output pulse of multiply charged ions in the rf pulse mode is explained. The numerical simulation of the ion cooling and rf pulse processes for the MINIMAFIOS type ECRIS has been carried out. The simultaneous applications of ion cooling and pulse regime is proposed for pulse injection of highly charged ions in heavy ion accelerators and storage rings.