REDUCTION IN X-RAY-LITHOGRAPHY SHOT NOISE EXPOSURE LIMIT BY DISSOLUTION PHENOMENA

被引：44

作者：

NEUREUTHER, AR ^{[1
]}

WILLSON, CG ^{[1
]}

机构：

[1] IBM,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584037

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：167 / 173

页数：7

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[J]. SOLID STATE TECHNOLOGY, 1981, 24 (08) : 57 - 59
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