IMPURITY DIFFUSION OUT OF IMPLANTED LAYERS OF SILICON UNDER CONDITIONS OF RAPID PULSED ANNEALING

被引：0
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作者：
ALEKSANDROV, OV
KOZLOVSKII, VV
POPOV, VV
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来源：
INORGANIC MATERIALS | 1990年 / 26卷 / 06期
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T [工业技术];
学科分类号：
08 ;
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页码：961 / 963
页数：3
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