GROWTH OF C-AXIS ORIENTED ZNO THIN-FILMS WITH HIGH DEPOSITION RATE ON SILICON BY CVD METHOD

被引:35
|
作者
SHIMIZU, M
SHIOSAKI, T
KAWABATA, A
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关键词
D O I
10.1016/0022-0248(82)90253-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:94 / 100
页数:7
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