DOPING OF HIGHLY TETRAHEDRAL AMORPHOUS-CARBON

被引:0
|
作者
AMARATUNGA, GAJ
VEERASAMY, VS
DAVIS, CA
MILNE, WI
MCKENZIE, DR
YUAN, J
WEILER, M
机构
[1] UNIV SYDNEY, SCH PHYS, SYDNEY, NSW 2006, AUSTRALIA
[2] UNIV CAMBRIDGE, CAVENDISH LAB, CAMBRIDGE CB3 0HE, CAMBS, ENGLAND
[3] UNIV KAISERSLAUTERN, DEPT PHYS, W-6750 KAISERSLAUTERN, GERMANY
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中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The doping of amorphous carbon films with over 80% sp(3) bonding is examined. It is shown that n-type doping with P and N is possible. p-type doping with B has been unsuccessful. The electronic properties of this form of amorphous carbon which has an optical band-gap of 2eV is taken as being governed largely by the pi and pi* states which arise due to the much smaller fraction of sp(2) bonded C. With low levels of N doping there is evidence for compensation of p-type defects in the undoped material. It is thought that dopants which have deep levels in diamond appear as shallow dopants in tetrahedral amorphous carbon due to the presence of the pi states.
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页码:1119 / 1122
页数:4
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