EFFECTS OF OXIDATION ON ELECTRICAL CHARACTERISTICS OF SILICON-ON-SAPPHIRE FILMS

被引:27
|
作者
ROSS, EC
WARFIELD, G
机构
关键词
D O I
10.1063/1.1657985
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2339 / &
相关论文
共 50 条
  • [1] CHARACTERIZATION OF SILICON-ON-SAPPHIRE FILMS FOR LSI TECHNOLOGY
    LEE, CC
    HU, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C85 - C85
  • [2] SILICON-ON-SAPPHIRE - MATERIAL PROPERTIES AND DEVICE CHARACTERISTICS
    DUMIN, DJ
    KEEN, RS
    LUKS, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (03) : C93 - +
  • [3] Epitaxial TiN films on sapphire and silicon-on-sapphire by pulsed laser deposition
    Vispute, RD
    Dovidenko, K
    Jagannadham, K
    Narayan, J
    ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS, 1996, 397 : 271 - 276
  • [4] FILAMENTATION IN SILICON-ON-SAPPHIRE HOMOGENEOUS THIN-FILMS
    PONTIUS, DH
    SMITH, WB
    BUDENSTEIN, PP
    JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 331 - 340
  • [5] Spectroscopic Investigation of Quantum Confinement Effects in Ion Implanted Silicon-on-Sapphire Films
    Rajesh Kumar
    H. S. Mavi
    A. K. Shukla
    Silicon, 2010, 2 : 25 - 31
  • [6] EFFECT OF ARSENIC IN IMPROVING LIFETIME IN SILICON-ON-SAPPHIRE FILMS
    MCGREIVY, DJ
    VISWANAT.CR
    APPLIED PHYSICS LETTERS, 1974, 25 (09) : 505 - 506
  • [8] Monitoring the electrical properties of the back silicon interface of silicon-on-sapphire wafers
    Domyo, Hiroshi
    Bertling, Karl
    Ho, Tran
    Kistler, Neal
    Imthurn, George
    Stuber, Michael
    Rakic, Aleksandar D.
    Yeow, Yew-Tong
    IEEE ELECTRON DEVICE LETTERS, 2008, 29 (04) : 325 - 327
  • [9] SILICON-ON-SAPPHIRE FILMS WITH NEGATIVE AND POSITIVE INTERFACIAL CHARGES
    TSENG, WF
    REPACE, JL
    HUGHES, HL
    CHRISTOU, A
    THIN SOLID FILMS, 1981, 82 (03) : 213 - 216
  • [10] THE NON-DESTRUCTIVE CHARACTERIZATION OF SILICON-ON-SAPPHIRE FILMS
    PITT, MG
    PETERS, TB
    DINEEN, C
    VACUUM, 1985, 35 (10-1) : 512 - 513