PHOTO-ASSISTED ANISOTROPIC ETCHING OF PHOSPHORUS-DOPED POLYCRYSTALLINE SILICON EMPLOYING REACTIVE SPECIES GENERATED BY A MICROWAVE-DISCHARGE

被引:23
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作者
HAYASAKA, N
OKANO, H
SEKINE, M
HORIIKE, Y
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10.1063/1.96458
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O59 [应用物理学];
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页码:1165 / 1166
页数:2
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