HYDROGEN CHEMISORPTION ON THE SI(100) SURFACE

被引：27
|
作者：
ZHENG, XM
SMITH, PV
机构：
[1] Department of Physics, University of Newcastle, Newcastle
来源：
SURFACE SCIENCE | 1992年 / 279卷 / 1-2期
基金：
澳大利亚研究理事会;
关键词：
D O I：
10.1016/0039-6028(92)90749-V
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Hydrogen chemisorption on the Si(100) surface has been studied by the SLAB-MINDO method. The lowest energy configuration is found to be a 1 x 1 molecular-like dihydride topology and the Si(100)3 x 1 : 4/3H phase shown to be a transitional state between the Si(100)2 x 1 : H and Si(100)1 x 1 : H-2 phases. These results are compared with earlier studies of hydrogen chemisorption on the diamond (100) surface.
引用
收藏
页码：127 / 136
页数：10
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