SURFACE ORGANOMETALLIC CHEMISTRY IN THE CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS USING TRIISOBUTYLALUMINUM - BETA-HYDRIDE AND BETA-ALKYL ELIMINATION-REACTIONS OF SURFACE ALKYL INTERMEDIATES

被引：194

|

作者：

BENT, BE ^{[1
]}

NUZZO, RG ^{[1
]}

DUBOIS, LH ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1989年 / 111卷 / 05期

关键词：

D O I：

10.1021/ja00187a016

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：1634 / 1644

页数：11

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[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1991, 113 (04) : 1137 - 1142
[2] Effects of alkyl chain structure on carbon-halogen bond dissociation and beta-hydride elimination by alkyl halides on a Cu(100) surface
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[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1996, 100 (25): : 10721 - 10731
[3] BETA-FLUORIDE ELIMINATION-REACTIONS OF FLUORINATED ALKYL-GROUPS ON THE AG(111) SURFACE
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[J]. LANGMUIR, 1995, 11 (11) : 4433 - 4439
[4] SURFACE CHEMICAL-REACTIONS IN THE METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1920 - 1922
[5] BETA-HYDRIDE ELIMINATION FROM ALKYL AND CYCLOALKYL GROUPS ON A CU(100) SURFACE - RING STRAIN AND PLANARITY OF THE TRANSITION-STATE
TEPLYAKOV, AV
BENT, BE
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1995, 117 (40) : 10076 - 10087