STUDY OF CONTAMINATION ON ELECTROPLATED GOLD, COPPER, PLATINUM, AND PALLADIUM

被引：9

作者：

MALM, DL ^{[1
]}

VASILE, MJ ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 11期

关键词：

D O I：

10.1149/1.2403287

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1484 / 1487

页数：4

共 50 条

[1] Platinum contamination of palladium in palladium point determinations
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[10] ELECTROPLATED GOLD AND COPPER CONTACTS TO CADMIUM SULFIDE
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