Interaction of Di-Methylaluminum Groups with Hydroxyl Groups on a Fully Hydroxyl-Terminated Si (001) Surface

被引:4
|
作者
Kim, Dae-Hee [1 ]
Kim, Dae-Hyun [1 ]
Kim, Yeong-Cheol [1 ]
Seo, Hwa-Il [2 ]
机构
[1] Korea Univ Technol & Educ, Dept Mat Engn, Cheonan 330708, South Korea
[2] Korea Univ Technol & Educ, Sch Informat Technol, Cheonan 330708, South Korea
关键词
Tri-methylaluminum; Di-methylaluminum; Atomic layer deposition; Si surface;
D O I
10.4313/TEEM.2010.11.1.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The interaction of -Al(CH3)(2) with -OH on a fully OH-terminated Si (001) surface was studied using density functional theory. Two sites for Al(CH3)(3) to react with the -OH on the surface were identified. The -Al(CH3)(2) product energetically favored the dimer-row site rather than the inter-row site because the Al atom of -Al(CH3)(2) at the dimer-row site was attracted by the lone pair electrons of the O atom in the neighboring -OH. The energy barrier for the transfer of the -Al(CH3)(2) between the two sites was 0.11 eV, and therefore, the -Al(CH3)(2) at the inter-row site can easily transfer to the dimer-row site at room temperature.
引用
收藏
页码:11 / 14
页数:4
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