STM AND AFM STUDY OF LAYERED TRANSITION-METAL HALIDES AND CHALCOGENIDES

被引:0
|
作者
WHANGBO, MH [1 ]
REN, J [1 ]
LIANG, W [1 ]
MAGONOV, SN [1 ]
BENGEL, H [1 ]
机构
[1] ALBERT LUDWIGS UNIV,MAT RES CTR,D-79104 FREIBURG,GERMANY
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:376 / INOR
相关论文
共 50 条
  • [1] STM AND AFM STUDIES OF TRANSITION-METAL CHALCOGENIDES
    KELTY, SP
    RUPPERT, AF
    CHIANELLI, RR
    REN, J
    WHANGBO, MH
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1994, 208 : 51 - PETR
  • [2] ANALYSIS OF THE STM IMAGES OF LAYERED TRANSITION-METAL CHALCOGENIDES AND CHLORIDES
    REN, J
    WHANGBO, MH
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1992, 204 : 288 - INOR
  • [3] LAYERED TRANSITION-METAL CHALCOGENIDE HALIDES
    MILLER, GJ
    LIN, JH
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1992, 203 : 184 - INOR
  • [4] CATHODIC REDUCTION OF LAYERED TRANSITION-METAL CHALCOGENIDES
    SCHOLLHORN, R
    MEYER, H
    MATERIALS RESEARCH BULLETIN, 1974, 9 (09) : 1237 - 1246
  • [5] TEM and STM studies of some transition-metal chalcogenides with reduced dimensionality
    Prodan, A
    PROCEEDINGS OF THE 5TH MULTINATIONAL CONGRESS ON ELECTRON MICROSCOPY, 2001, : 405 - 416
  • [6] OPTICAL-PROPERTIES OF LAYERED TRANSITION-METAL HALIDES
    THOMAS, J
    JEZEQUEL, G
    POLLINI, I
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1990, 2 (24) : 5439 - 5453
  • [7] STM STUDY OF TRANSITION-METAL OXIDE
    OSHIO, T
    SAKAI, Y
    MORIYA, T
    EHARA, S
    ULTRAMICROSCOPY, 1992, 42 : 744 - 748
  • [8] PREPARATION AND CHARACTERIZATION OF NEW LAYERED TERNARY AND QUATERNARY TRANSITION-METAL CHALCOGENIDES
    SQUATTRITO, PJ
    IBERS, JA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1985, 190 (SEP): : 189 - INR
  • [9] NONSTOICHIOMETRY OF TRANSITION-METAL CHALCOGENIDES
    JELLINEK, F
    ACTA CRYSTALLOGRAPHICA SECTION A, 1972, 28 : S53 - S53
  • [10] EARLY TRANSITION-METAL CHALCOGENIDES
    TREMEL, W
    KLEINKE, H
    DERSTROFF, V
    REISNER, C
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 188 - INOR