INTERDIFFUSION IN A SYMMETRICALLY STRAINED GE/SI SUPERLATTICE

被引：54
|
作者：
CHANG, SJ [1 ]
WANG, KL [1 ]
BOWMAN, RC [1 ]
ADAMS, PM [1 ]
机构：
[1] AEROSPACE CORP, LOS ANGELES, CA 90009 USA
来源：
APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 13期
关键词：
D O I：
10.1063/1.100731
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1253 / 1255
页数：3
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