DISSOLUTION DYNAMICS OF SOFT-X-RAY EXPOSED NOVOLAK RESIST FILMS

被引：0
|
作者：
PETERS, DW [1 ]
WEST, RJ [1 ]
机构：
[1] OLIN HUNT SPECIALTY PROD INC,E PROVIDENCE,RI 02914
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期
关键词：
D O I：
10.1116/1.584451
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1751 / 1755
页数：5
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