KINETICALLY TAILORED PROPERTIES OF ELECTRON-BEAM EXCITED XEF(C-]A) AND XEF(B-]X) LASER MEDIA USING AN AR-KR BUFFER MIXTURE

被引:22
|
作者
NIGHAN, WL [1 ]
SAUERBREY, RA [1 ]
ZHU, YP [1 ]
TITTEL, FK [1 ]
WILSON, WL [1 ]
机构
[1] RICE UNIV,DEPT ELECT & COMP ENGN,HOUSTON,TX 77251
关键词
ARGON - ELECTRON BEAMS - KRYPTON - LASER PULSES;
D O I
10.1109/JQE.1987.1073314
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Use of two-component buffer gas comprised of Ar and Kr results in electron-beam excited XeF(C yields A) laser pulse energy and intrinsic efficiency values comparable to those of UV rare gas-halide lasers. Measurements have been performed of transient absorption confirming that the primary effect of a buffer comprised of Ar and Kr is a significantly lower level of ionized and excited species that absorb in the blue-green spectral region. Spectral analysis of a variety of mixtures shows that the Ar-Kr buffer also benefits XeF(C yields A) laser performance due to an increase in gain in the 400-450 nm region caused by the presence of the Kr//2 F excimer. In addition, a large increase in absorption at approx. 351 nm, also due to Kr//2 F, suppresses oscillation on the competitive XeF(B yields X) transition and, for certain conditions, makes efficient simultaneous oscillation of the XeF(B yields X) and XeF(C yields A) laser transitions possible.
引用
收藏
页码:253 / 261
页数:9
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