A NEW SYSTEM FOR VACUUM DEPOSITION OF REFRACTORY MATERIALS USING AN ATMOSPHERIC-PRESSURE INDUCTIVELY COUPLED PLASMA

被引：9
|
作者：
MERKLE, BD
KNISELEY, RN
SCHMIDT, FA
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 03期
关键词：
D O I：
10.1063/1.339859
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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收藏
页码：1017 / 1021
页数：5
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