INSITU ION-IMPLANTATION FOR QUANTITATIVE SECONDARY ION AND SPUTTERED NEUTRAL MASS-SPECTROMETRY ANALYSIS

被引：6

作者：

GNASER, H ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH, INST GRENZFLACHENFORSCH & VAKUUMPHYS, D-5170 JULICH 1, FED REP GER

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 03期

关键词：

D O I：

10.1063/1.337367

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1212 / 1214

页数：3

共 50 条

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