SURFACE STABILIZATION OF SODIUM SILICATE GLASS BY ION-EXCHANGE AND CHEMICAL VAPOR-DEPOSITION

被引：0

作者：

FAIN, CC

BRANDT, WF

HULBERT, SF

ROBINSON, GC

机构：

来源：

AMERICAN CERAMIC SOCIETY BULLETIN | 1972年 / 51卷 / 04期

关键词：

D O I：

暂无

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：375 / +

共 50 条

[1] ION-EXCHANGE IN SODIUM SILICATE GLASS
VARSHNEY.AK
[J]. AMERICAN CERAMIC SOCIETY BULLETIN, 1974, 53 (04): : 354 - 355
[2] COATING OF GLASS BY CHEMICAL VAPOR-DEPOSITION
BLOCHER, JM
[J]. THIN SOLID FILMS, 1981, 77 (1-3) : 51 - 63
[3] SURFACE STABILIZATION OF A SOLUBLE GLASS BY ALKALI ION-EXCHANGE PROCESSES
FAIN, CC
HULBERT, SF
CARROL, JA
[J]. AMERICAN CERAMIC SOCIETY BULLETIN, 1972, 51 (04): : 375 - +
[4] SURFACE FINISHING BY CHEMICAL VAPOR-DEPOSITION
SHIKATA, N
[J]. JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS, 1986, 31 (08): : 579 - 584
[5] CHEMICAL VAPOR-DEPOSITION OF ALUMINUM SILICATE THIN-FILMS
APBLETT, AW
CHEATHAM, LK
BARRON, AR
[J]. JOURNAL OF MATERIALS CHEMISTRY, 1991, 1 (01) : 143 - 144
[6] SURFACE MECHANISMS IN ALUMINUM CHEMICAL VAPOR-DEPOSITION
MANTELL, DA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 1045 - 1050
[7] CHEMICAL VAPOR-DEPOSITION OF BORON ON A BERYLLIUM SURFACE
DAS, DK
KUMAR, K
[J]. THIN SOLID FILMS, 1981, 83 (01) : 53 - 60
[8] CHEMICAL VAPOR-DEPOSITION
HIROSE, M
[J]. SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
[9] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
[J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 5 - IAEC
[10] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
[J]. ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 199 - 263