EFFECT OF O2 ON N2 AFTERGLOW

被引:0
|
作者
SRIVASTA.AN
SHUKLA, RV
GUPTA, SK
机构
来源
CURRENT SCIENCE | 1971年 / 40卷 / 14期
关键词
D O I
暂无
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
引用
收藏
页码:365 / &
相关论文
共 50 条
  • [1] SECOND POSITIVE BANDS OF N2 IN AFTERGLOW OF N2 AND O2 MIXTURE
    GHOSH, SN
    SRIVASTAVA, AN
    SHUKLA, RV
    INDIAN JOURNAL OF PHYSICS, 1970, 44 (03) : 162 - +
  • [2] Electrical characterization of the flowing afterglow of N2 and N2/O2 microwave plasmas at reduced pressure
    Ferreira, J. Afonso
    Stafford, L.
    Leonelli, R.
    Ricard, A.
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (16)
  • [3] EXPERIMENTAL STUDY OF NO2 CONTINUUM IN AFTERGLOW OF N2 AND O2 MIXTURE
    GHOSH, SN
    SRIVASTAVA, AN
    SHUKLA, RV
    ANNALES DE GEOPHYSIQUE, 1970, 26 (01): : 53 - +
  • [4] ENERGY DEPENDENCE OF REACTIONS OF O+ WITH N2 O2 .2. AFTERGLOW MEASUREMENTS
    NAKSHBANDI, MM
    HASTED, JB
    PLANETARY AND SPACE SCIENCE, 1967, 15 (11) : 1781 - +
  • [5] PREDISSOCIATION IN N2 AND O2
    HUDSON, RD
    CARTER, VL
    CANADIAN JOURNAL OF CHEMISTRY, 1969, 47 (10): : 1840 - &
  • [6] The effect of annealing graphene in O2 and N2 flow
    Tokuda, Fuyuki
    Honda, Mitsuhiro
    Ichikawa, Yo
    8TH INTERNATIONAL CONFERENCE ON NANOSCIENCE AND NANOTECHNOLOGY 2017 (NANO-SCITECH 2017), 2018, 1963
  • [7] Removal of NO in NO/N2, NO/N2/O2, NO/CH4/N2, and NO/CH4/O2/N2 systems by flowing microwave discharges
    Hueso, Jose L.
    Gonzalez-Elipe, Agustin R.
    Cotrino, Jose
    Caballero, Alfonso
    JOURNAL OF PHYSICAL CHEMISTRY A, 2007, 111 (06): : 1057 - 1065
  • [8] PHOTODISSOCIATION CONTINUUMS OF N2 AND O2
    COOK, GR
    OGAWA, M
    CARLSON, RW
    TRANSACTIONS-AMERICAN GEOPHYSICAL UNION, 1973, 54 (02): : 108 - 108
  • [9] REACTIVE SPUTTERING OF INP IN N2 AND N2/O2 PLASMAS
    SUNDARARAMAN, CS
    LAFONTAINE, H
    POULIN, S
    MOUTON, A
    CURRIE, JF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (03): : 1433 - 1439
  • [10] DISCUSSION OF PREDISSOCIATION IN N2 AND O2
    LAWRENCE, GM
    MCGOWAN, JW
    HUFFMAN, RE
    GILMORE, FR
    CANADIAN JOURNAL OF CHEMISTRY, 1969, 47 (10): : 1844 - &