EFFECT OF ACID DIFFUSION ON PERFORMANCE IN POSITIVE DEEP-ULTRAVIOLET RESISTS

被引：78
|
作者：
FEDYNYSHYN, TH
THACKERAY, JW
GEORGER, JH
DENISON, MD
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587569
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：3888 / 3894
页数：7
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